Cover Image

Advances in resist technology and processing XX : 24-26 February 2003, Santa Clara, California, USA /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, International SEMATECH, Semiconductor Equipment and Materials International
Other Authors: Fedynyshyn, Theodore H., 1952-
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [2003]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 5039.
Subjects:
Photoresists > Congresses.
Microlithography > Congresses.
Description
Physical Description:2 volumes (xxxi, 1460 pages) : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819448443