Advances in resist technology and processing XX : 24-26 February 2003, Santa Clara, California, USA /

Bibliographic Details
Corporate Authors:	Society of Photo-optical Instrumentation Engineers, International SEMATECH, Semiconductor Equipment and Materials International
Other Authors:	Fedynyshyn, Theodore H., 1952-
Format:	Book
Language:	English
Published:	Bellingham, Washington : SPIE, [2003]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 5039.
Subjects:	Photoresists > Congresses. Microlithography > Congresses.

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