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22nd Annual BACUS Symposium on Photomask Technology : 1-4 October 2002, Monterey, California, USA /

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Bibliographic Details
Corporate Authors: Symposium on Photomask Technology Monterey, Calif., BACUS (Technical group), Society of Photo-optical Instrumentation Engineers
Other Authors: Grenon, Brian J., Kimmel, Kurt R.
Format: Conference Proceeding Book
Language:English
Published: Bellingham, Washington : SPIE, [2002]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 4889.
Subjects:
Integrated circuits > Masks > Congresses.
Microlithography > Congresses.

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Call Number: TK7874 .S9435 2002
Library Owns: TK7874 .S9435 2002 (pt.1-pt.2)
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TK7874 .S9435 2002 pt.1 Available
TK7874 .S9435 2002 pt.2 Available