Chemical-mechanical polishing of low dielectric constant polymers and organosilicate glasses : fundamental mechanisms and application to IC interconnect technology /

Bibliographic Details
Main Author:	Borst, Christopher L. (Christopher Lyle)
Other Authors:	Gill, William N., Gutmann, Ronald J.
Format:	Book
Language:	English
Published:	Boston : Kluwer Academic Publishers, [2002]
Subjects:	Interconnects (Integrated circuit technology) Semiconductors > Polishing. Grinding and polishing.

Remote Storage