APA (7th ed.) Citation

Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, International SEMATECH, & Fedynyshyn, T. H. (2002). Advances in resist technology and processing XIX: 4-6 March 2002, Santa Clara, USA. SPIE.

Chicago Style (17th ed.) Citation

Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, International SEMATECH, and Theodore H. Fedynyshyn. Advances in Resist Technology and Processing XIX: 4-6 March 2002, Santa Clara, USA. Bellingham, Washington: SPIE, 2002.

MLA (9th ed.) Citation

Society of Photo-optical Instrumentation Engineers, et al. Advances in Resist Technology and Processing XIX: 4-6 March 2002, Santa Clara, USA. SPIE, 2002.