Cover Image

Advances in resist technology and processing XIX : 4-6 March 2002, Santa Clara, USA /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, International SEMATECH
Other Authors: Fedynyshyn, Theodore H., 1952-
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [2002]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 4690.
Subjects:
Photoresists > Congresses.
Microlithography > Congresses.

Remote Storage

Holdings details from Remote Storage
Call Number: TK7874 .A25 2002
Library Owns: TK7874 .A25 2002 (pt.1-pt.2)
Call Number Status Get It
TK7874 .A25 2002 pt.1 Available
TK7874 .A25 2002 pt.2 Available