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Gate stack and silicide issues in silicon processing II : symposium held April 17-19, 2001, San Francisco, California, U.S.A. /

Bibliographic Details
Other Authors: Campbell, S. A.
Format: Book
Language:English
Published: Warrendale, Pa. : Materials Research Society, [2002]
Series:Materials Research Society symposia proceedings ; v. 670.
Subjects:
Integrated circuits, Ultra large scale integration > Materials > Congresses.
Silicides > Congresses.
Gate array circuits > Congresses.
Electric leakage > Congresses.

Remote Storage

Holdings details from Remote Storage
Call Number: TK7874.76 .G3823 2002
 
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TK7874.76 .G3823 2002 Available