Optical microlithography XIV : 27 February-2 March 2001, Santa Clara, USA /

Bibliographic Details
Corporate Authors:	Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, International SEMATECH
Other Authors:	Progler, Christopher J.
Format:	Book
Language:	English
Published:	Bellingham, Wash. : SPIE, [2001]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 4346.
Subjects:	Integrated circuits > Masks > Congresses. Microlithography > Congresses. X-ray lithography > Congresses. Manufacturing processes > Congresses.

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