| Tag |
First Indicator |
Second Indicator |
Subfields |
| LEADER |
00000cam a2200000 a 4500 |
| 001 |
in00001660813 |
| 005 |
20151023093909.0 |
| 008 |
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| 020 |
|
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|a 0819440310
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|a (OCoLC)ocm48152924
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|
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|a TXAM
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| 090 |
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|a TK7874
|b .A25 2001
|
| 245 |
0 |
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|a Advances in resist technology and processing XVIII :
|b 26-28 February 2001, Santa Clara, USA /
|c Francis M. Houlihan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
|
| 246 |
3 |
0 |
|a Advances in resist technology and processing eighteen
|
| 246 |
3 |
|
|a Advances in resist technology and processing 18
|
| 264 |
|
1 |
|a Bellingham, Washington :
|b SPIE,
|c [2001]
|
| 264 |
|
4 |
|c ©2001
|
| 300 |
|
|
|a 2 volumes (xxix, 1064 pages) :
|b illustrations ;
|c 28 cm.
|
| 336 |
|
|
|a text
|b txt
|2 rdacontent
|
| 337 |
|
|
|a unmediated
|b n
|2 rdamedia
|
| 338 |
|
|
|a volume
|b nc
|2 rdacarrier
|
| 490 |
1 |
|
|a Proceedings / SPIE--the international society for optical engineering ;
|v v. 4345
|
| 504 |
|
|
|a Includes bibliographical references and index.
|
| 650 |
|
0 |
|a Photoresists
|v Congresses.
|
| 650 |
|
0 |
|a Microlithography
|v Congresses.
|
| 700 |
1 |
|
|a Houlihan, Francis M.
|
| 710 |
2 |
|
|a Society of Photo-optical Instrumentation Engineers.
|
| 710 |
2 |
|
|a Semiconductor Equipment and Materials International.
|
| 710 |
2 |
|
|a International SEMATECH.
|
| 830 |
|
0 |
|a Proceedings of SPIE--the International Society for Optical Engineering ;
|v v. 4345.
|
| 948 |
|
|
|a cataloged
|b h
|c 2001/11/20
|d c
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|k pt.2
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