Cover Image

Advances in resist technology and processing XVIII : 26-28 February 2001, Santa Clara, USA /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, International SEMATECH
Other Authors: Houlihan, Francis M.
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [2001]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 4345.
Subjects:
Photoresists > Congresses.
Microlithography > Congresses.

Remote Storage

Holdings details from Remote Storage
Call Number: TK7874 .A25 2001
Library Owns: TK7874 .A25 2001 (pt.1-pt.2)
Call Number Status Get It
TK7874 .A25 2001 pt.1 Available
TK7874 .A25 2001 pt.2 Available