Cover Image

Advances in resist technology and processing XVIII : 26-28 February 2001, Santa Clara, USA /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, International SEMATECH
Other Authors: Houlihan, Francis M.
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [2001]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 4345.
Subjects:
Photoresists > Congresses.
Microlithography > Congresses.
Description
Physical Description:2 volumes (xxix, 1064 pages) : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819440310