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Photomask and next-generation lithography mask technology VIII : 25-26 April 2001, Yokohama, Japan /

Bibliographic Details
Corporate Authors: Photomask Japan Symposium, BACUS (Technical group), Ōyō Butsuri Gakkai, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers
Other Authors: Kawahira, Hiroichi
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [2001]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 4409.
Subjects:
Masks (Electronics) > Congresses.
Integrated circuits > Masks > Congresses.
X-ray lithography > Congresses.
Microlithography > Congresses.
Optoelectronic devices > Design and construction > Congresses.

Remote Storage

Holdings details from Remote Storage
Call Number: TK7874 .P46 2001
 
Call Number Status Get It
TK7874 .P46 2001 Available