In-line characterization, yield, reliability, and failure analysis in microelectronic manufacturing II : 31 May-1 June 2001, Edinburgh, UK /

Bibliographic Details
Corporate Authors:	Society of Photo-optical Instrumentation Engineers, Scottish Enterprise, European Optical Society, Institution of Electrical Engineers
Other Authors:	Kissinger, Gudrun, Weiland, Larg H.
Format:	Book
Language:	English
Published:	Bellingham, Washington : SPIE, [2001]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 4406.
Subjects:	Integrated circuits > Very large scale integration > Design and construction > Congresses. Semiconductors > Design and construction > Congresses. Manufacturing processes > Congresses. Microelectronics > Materials > Congresses.

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