Lithography for semiconductor manufacturing II : 30 May-1 June 2001, Edinburgh, UK /

Bibliographic Details
Corporate Authors:	Society of Photo-optical Instrumentation Engineers, Scottish Enterprise, European Optical Society, Institution of Electrical Engineers
Other Authors:	Mack, Chris A., Stevenson, Tom
Format:	Book
Language:	English
Published:	Bellingham, Washington : SPIE, [2001]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 4404.
Subjects:	Integrated circuits > Very large scale integration > Congresses. Printed circuits > Congresses. Lithography > Congresses.

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