The physics and chemistry of SiO₂ and the Si-SiO₂ interface--4, 2000 : proceedings of the Fourth International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface, Toronto, Canada, May 15-18, 2000 /

Bibliographic Details
Corporate Authors:	International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface Toronto, Ont., Electrochemical Society. Electronics Division, Electrochemical Society. Dielectric Science and Technology Division
Other Authors:	Massoud, Hisham Z.
Format:	Conference Proceeding Book
Language:	English
Published:	Pennington, NJ : Electrochemical Society, [2000]
Series:	Proceedings (Electrochemical Society) ; v. 2000-2.
Subjects:	Silica > Surfaces > Congresses. Dielectrics > Surfaces > Congresses. Silicon dioxide films > Congresses. Surface chemistry > Congresses. Surfaces (Technology) > Congresses.

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