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20th Annual BACUS Symposium on Photomask Technology : 13-15 September 2000, Monterey, [California] USA /

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Bibliographic Details
Corporate Authors: Symposium on Photomask Technology Monterey, California, BACUS (Technical group), Society of Photo-optical Instrumentation Engineers
Other Authors: Grenon, Brian J., Dao, Giang T.
Format: Conference Proceeding Book
Language:English
Published: Bellingham, Washington : SPIE, [2001]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 4186.
Subjects:
Integrated circuits > Masks > Congresses.
Microlithography > Congresses.
Description
Item Description:Eighteenth conference entitled: Symposium on Photomask Technology and Management.
Physical Description:xv, 938 pages : illustrations (some color) ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819438499