20th Annual BACUS Symposium on Photomask Technology : 13-15 September 2000, Monterey, [California] USA /

Bibliographic Details
Corporate Authors:	Symposium on Photomask Technology Monterey, California, BACUS (Technical group), Society of Photo-optical Instrumentation Engineers
Other Authors:	Grenon, Brian J., Dao, Giang T.
Format:	Conference Proceeding Book
Language:	English
Published:	Bellingham, Washington : SPIE, [2001]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 4186.
Subjects:	Integrated circuits > Masks > Congresses. Microlithography > Congresses.

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