Cover Image

Photomask and next-generation lithography mask technology VII : 12-13 April 2000, Yokohama, Japan /

Bibliographic Details
Corporate Authors: Photomask Japan, BACUS (Technical group), Society of Photo-optical Instrumentation Engineers, Ōyō Butsuri Gakkai, Seimitsu Kōgakkai, Denki Gakkai (1888), Semiconductor Equipment and Materials International (Japan)
Other Authors: Morimoto, Hiraoki
Format: Book
Language:English
Published: Bellingham, Wash., USA : SPIE, [2000]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 4066.
Subjects:
Masks (Electronics) > Congresses.
Integrated circuits > Masks > Congresses.
X-ray lithography > Congresses.
Microlithography > Congresses.
Optoelectronic devices > Design and construction > Congresses.
Description
Item Description:Earlier proceedings have title: Photomask and X-ray mask technology.
Physical Description:xv, 750 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819437026