Photomask and next-generation lithography mask technology VII : 12-13 April 2000, Yokohama, Japan /

Bibliographic Details
Corporate Authors:	Photomask Japan, BACUS (Technical group), Society of Photo-optical Instrumentation Engineers, Ōyō Butsuri Gakkai, Seimitsu Kōgakkai, Denki Gakkai (1888), Semiconductor Equipment and Materials International (Japan)
Other Authors:	Morimoto, Hiraoki
Format:	Book
Language:	English
Published:	Bellingham, Wash., USA : SPIE, [2000]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 4066.
Subjects:	Masks (Electronics) > Congresses. Integrated circuits > Masks > Congresses. X-ray lithography > Congresses. Microlithography > Congresses. Optoelectronic devices > Design and construction > Congresses.

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