Cover Image

Emerging lithographic technologies IV : 28 February-1 March, 2000, Santa Clara, [California], USA /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, SEMATECH (Organization)
Other Authors: Dobisz, Elizabeth A. (Elizabeth Ann)
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [2000]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 3997.
Subjects:
Lithography, Electron beam > Congresses.
Microlithography > Industrial applications > Congresses.
X-ray lithography > Congresses.
X-rays > Industrial applications > Congresses.
Masks (Electronics) > Congresses.
Description
Physical Description:xv, 900 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819436151