Emerging lithographic technologies IV : 28 February-1 March, 2000, Santa Clara, [California], USA /

Bibliographic Details
Corporate Authors:	Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, SEMATECH (Organization)
Other Authors:	Dobisz, Elizabeth A. (Elizabeth Ann)
Format:	Book
Language:	English
Published:	Bellingham, Washington : SPIE, [2000]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 3997.
Subjects:	Lithography, Electron beam > Congresses. Microlithography > Industrial applications > Congresses. X-ray lithography > Congresses. X-rays > Industrial applications > Congresses. Masks (Electronics) > Congresses.

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