Cover Image

Advances in resist technology and processing XVII : 28 February-1 March 2000, Santa Clara, USA /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, International SEMATECH
Other Authors: Houlihan, Francis M.
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [2000]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 3999.
Subjects:
Photoresists > Congresses.
Microlithography > Congresses.
Description
Physical Description:2 volumes (xvii, 1252 pages) : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819436178