Advances in resist technology and processing XVII : 28 February-1 March 2000, Santa Clara, USA /

Bibliographic Details
Corporate Authors:	Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, International SEMATECH
Other Authors:	Houlihan, Francis M.
Format:	Book
Language:	English
Published:	Bellingham, Washington : SPIE, [2000]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 3999.
Subjects:	Photoresists > Congresses. Microlithography > Congresses.

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