APA (7th ed.) Citation

Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, International SEMATECH, & Houlihan, F. M. (2000). Advances in resist technology and processing XVII: 28 February-1 March 2000, Santa Clara, USA. SPIE.

Chicago Style (17th ed.) Citation

Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, International SEMATECH, and Francis M. Houlihan. Advances in Resist Technology and Processing XVII: 28 February-1 March 2000, Santa Clara, USA. Bellingham, Washington: SPIE, 2000.

MLA (9th ed.) Citation

Society of Photo-optical Instrumentation Engineers, et al. Advances in Resist Technology and Processing XVII: 28 February-1 March 2000, Santa Clara, USA. SPIE, 2000.