Optical microlithography XIII : 1-3 March 2000, Santa Clara, [California], USA /

Bibliographic Details
Corporate Authors:	Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, SEMATECH (Organization)
Other Authors:	Progler, Christopher J.
Format:	Book
Language:	English
Published:	Bellingham, Washington : SPIE, [2000]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 4000.
Subjects:	Microlithography > Congresses. Integrated circuits > Masks > Congresses. X-ray lithography > Congresses. Manufacturing processes > Congresses.

Remote Storage