Cover Image

Metrology, inspection, and process control for microlithography XIV : 28 February-2 March 2000, Santa Clara, California /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, International SEMATECH
Other Authors: Sullivan, Neal T.
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [2000]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 3998.
Subjects:
Integrated circuits > Inspection > Congresses.
Integrated circuits > Measurement > Congresses.
Microlithography > Congresses.
Process control > Congresses.
Description
Physical Description:xiv, 938 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:081943616X