Metrology, inspection, and process control for microlithography XIV : 28 February-2 March 2000, Santa Clara, California /

Bibliographic Details
Corporate Authors:	Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, International SEMATECH
Other Authors:	Sullivan, Neal T.
Format:	Book
Language:	English
Published:	Bellingham, Washington : SPIE, [2000]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 3998.
Subjects:	Integrated circuits > Inspection > Congresses. Integrated circuits > Measurement > Congresses. Microlithography > Congresses. Process control > Congresses.

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