APA (7th ed.) Citation

Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, International SEMATECH, & Sullivan, N. T. (2000). Metrology, inspection, and process control for microlithography XIV: 28 February-2 March 2000, Santa Clara, California. SPIE.

Chicago Style (17th ed.) Citation

Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, International SEMATECH, and Neal T. Sullivan. Metrology, Inspection, and Process Control for Microlithography XIV: 28 February-2 March 2000, Santa Clara, California. Bellingham, Washington: SPIE, 2000.

MLA (9th ed.) Citation

Society of Photo-optical Instrumentation Engineers, et al. Metrology, Inspection, and Process Control for Microlithography XIV: 28 February-2 March 2000, Santa Clara, California. SPIE, 2000.