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19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California /

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Bibliographic Details
Corporate Authors: Symposium on Photomask Technology Monterey, Calif., BACUS (Technical group), Society of Photo-optical Instrumentation Engineers
Other Authors: Abboud, Frank E., Grenon, Brian J.
Format: Conference Proceeding Book
Language:English
Published: Bellingham, Wash., USA : SPIE, [1999]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 3873.
Subjects:
Integrated circuits > Masks > Congresses.
Microlithography > Congresses.
Description
Item Description:Eighteenth conference called: Symposium on Photomask Technology and Management.
Physical Description:2 volumes (xv, 1022 pages) : illustrations (some color) ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:081943468X