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19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California /

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Bibliographic Details
Corporate Authors: Symposium on Photomask Technology Monterey, Calif., BACUS (Technical group), Society of Photo-optical Instrumentation Engineers
Other Authors: Abboud, Frank E., Grenon, Brian J.
Format: Conference Proceeding Book
Language:English
Published: Bellingham, Wash., USA : SPIE, [1999]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 3873.
Subjects:
Integrated circuits > Masks > Congresses.
Microlithography > Congresses.

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Holdings details from Remote Storage
Call Number: TK7874 .S9435 1999
Library Owns: TK7874 .S9435 1999 (pt.1-2)
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TK7874 .S9435 1999 pt.1 Available
TK7874 .S9435 1999 pt.2 Available