Optimal burn-in strategy of gate oxide based on yield and reliability /

Yield and reliability are two very important factors rofilm Inc. that affect the success of the semiconductor manufacturing industry. The relationship between yield and reliability can be mathematically modeled in order to project gate oxide reliability of transistors in the ICs. This yield-reliabil...

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Bibliographic Details

Main Author:	Kim, Taeho, 1960-
Format:	Thesis Book
Language:	English
Published:	[Place of publication not identified] : [publisher not identified] ; 1998.
Subjects:	Major industrial engineering.
Online Access:	http://proxy.library.tamu.edu/login?url=http://proquest.umi.com/pqdweb?did=733039291&sid=1&Fmt=2&clientId=2945&RQT=309&VName=PQD