Cover Image

Photomask and X-ray mask technology VI : 13-14 April 1999, Yokohama, Japan /

Bibliographic Details
Corporate Authors: Photomask Japan, BACUS (Technical group), Ōyō Butsuri Gakkai
Other Authors: Morimoto, Hiraoki
Format: Book
Language:English
Published: Bellingham, Wash., USA : SPIE, [1999]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 3748.
Subjects:
Masks (Electronics) > Congresses.
Integrated circuits > Masks > Congresses.
X-ray lithography > Congresses.
Microlithography > Congresses.
Optoelectronic devices > Design and construction > Congresses.
Description
Physical Description:xiii, 628 pages : illustrations (some color) ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:081943230X