Photomask and X-ray mask technology VI : 13-14 April 1999, Yokohama, Japan /

Bibliographic Details
Corporate Authors:	Photomask Japan, BACUS (Technical group), Ōyō Butsuri Gakkai
Other Authors:	Morimoto, Hiraoki
Format:	Book
Language:	English
Published:	Bellingham, Wash., USA : SPIE, [1999]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 3748.
Subjects:	Masks (Electronics) > Congresses. Integrated circuits > Masks > Congresses. X-ray lithography > Congresses. Microlithography > Congresses. Optoelectronic devices > Design and construction > Congresses.

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