Ultrathin SiO₂ and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A. /

Bibliographic Details
Other Authors:	Huff, Howard R.
Format:	Book
Language:	English
Published:	Warrendale, Pa. : Materials Research Society, [1999]
Series:	Materials Research Society symposia proceedings ; v. 567.
Subjects:	Integrated circuits > Ultra large scale integration > Materials > Congresses. Silicon oxide films > Congresses. Gate array circuits > Materials > Congresses. Dielectrics > Congresses.

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