Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland /

Bibliographic Details
Corporate Authors:	European Optical Society, Society of Photo-optical Instrumentation Engineers, European Commission. Directorate-General XII, Science, Research, and Development, Scottish Enterprise, Sira Technology Centre (U.K.), Institution of Electrical Engineers
Other Authors:	Mack, Chris A., Stevenson, Tom
Format:	Book
Language:	English
Published:	Bellingham, Wash., USA : SPIE, [1999]
Series:	Europto series. Proceedings of SPIE--the International Society for Optical Engineering ; v. 3741.
Subjects:	Integrated circuits > Very large scale integration > Congresses. Printed circuits > Congresses. Lithography > Congresses.

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