Cover Image

18th Annual Symposium on Photomask Technology and Management : [proceedings] : 16-18 September 1998, Redwood City, California /

Bibliographic Details
Corporate Authors: Symposium on Photomask Technology and Management Redwood City, California, BACUS (Technical group), Society of Photo-optical Instrumentation Engineers
Other Authors: Grenon, Brian J., Abboud, Frank E.
Format: Conference Proceeding Book
Language:English
Published: Bellingham, Washington : SPIE, [1998]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 3546.
Subjects:
Integrated circuits > Masks > Congresses.
Microlithography > Congresses.
Description
Physical Description:xiii, 672 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819430072