18th Annual Symposium on Photomask Technology and Management : [proceedings] : 16-18 September 1998, Redwood City, California /

Bibliographic Details
Corporate Authors:	Symposium on Photomask Technology and Management Redwood City, California, BACUS (Technical group), Society of Photo-optical Instrumentation Engineers
Other Authors:	Grenon, Brian J., Abboud, Frank E.
Format:	Conference Proceeding Book
Language:	English
Published:	Bellingham, Washington : SPIE, [1998]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 3546.
Subjects:	Integrated circuits > Masks > Congresses. Microlithography > Congresses.

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