Cover Image

Photomask and X-ray mask technology V : 9-10 April 1998, Kawasaki, Japan /

Bibliographic Details
Corporate Authors: Photomask Japan, BACUS (Technical group), Society of Photo-optical Instrumentation Engineers
Other Authors: Aizaki, Naoaki
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [1998]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 3412.
Subjects:
Masks (Electronics) > Congresses.
Integrated circuits > Masks > Congresses.
X-ray lithography > Congresses.
Microlithography > Congresses.
Description
Physical Description:xiii, 616 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819428647