Photomask and X-ray mask technology V : 9-10 April 1998, Kawasaki, Japan /

Bibliographic Details
Corporate Authors:	Photomask Japan, BACUS (Technical group), Society of Photo-optical Instrumentation Engineers
Other Authors:	Aizaki, Naoaki
Format:	Book
Language:	English
Published:	Bellingham, Washington : SPIE, [1998]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 3412.
Subjects:	Masks (Electronics) > Congresses. Integrated circuits > Masks > Congresses. X-ray lithography > Congresses. Microlithography > Congresses.

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