Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California /

Bibliographic Details
Corporate Authors:	Society of Photo-optical Instrumention Engineers, Semiconductor Equipment and Materials International, SEMATECH (Organization)
Other Authors:	Conley, Willard
Format:	Book
Language:	English
Published:	Bellingham, Washington : SPIE, [1998]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 3333.
Subjects:	Photoresists > Congresses.

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