Cover Image

Photomask and X-ray mask technology IV : 17-18 April 1997, Kawasaki, Japan /

Bibliographic Details
Corporate Authors: Photomask Japan, BACUS (Technical group), Ōyō Butsuri Gakkai, Society of Photo-optical Instrumentation Engineers. Japan Chapter
Other Authors: Aizaki, Naoaki
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [1997]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 3096.
Subjects:
Masks (Electronics) > Congresses.
Integrated circuits > Masks > Congresses.
X-ray lithography > Congresses.
Microlithography > Congresses.
Description
Physical Description:xiii, 504 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819425168