Photomask and X-ray mask technology IV : 17-18 April 1997, Kawasaki, Japan /

Bibliographic Details
Corporate Authors:	Photomask Japan, BACUS (Technical group), Ōyō Butsuri Gakkai, Society of Photo-optical Instrumentation Engineers. Japan Chapter
Other Authors:	Aizaki, Naoaki
Format:	Book
Language:	English
Published:	Bellingham, Washington : SPIE, [1997]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 3096.
Subjects:	Masks (Electronics) > Congresses. Integrated circuits > Masks > Congresses. X-ray lithography > Congresses. Microlithography > Congresses.

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