Cover Image

Microlithography and metrology in micromachining III : 29-30 September 1997, Austin, Texas /

Bibliographic Details
Corporate Authors: Semiconductor Equipment and Materials Institute, National Institute of Standards and Technology (U.S.), Solid State Technology, Society of Photo-optical Instrumentation Engineers
Other Authors: Friedrich, Craig, Umeda, Akira
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [1997]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 3225.
Subjects:
Micromachining > Congresses.
Microlithography > Congresses.
Measurement > Congresses.
Description
Physical Description:vii, 134 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819426571
9780819426574