Microlithography and metrology in micromachining III : 29-30 September 1997, Austin, Texas /

Bibliographic Details
Corporate Authors:	Semiconductor Equipment and Materials Institute, National Institute of Standards and Technology (U.S.), Solid State Technology, Society of Photo-optical Instrumentation Engineers
Other Authors:	Friedrich, Craig, Umeda, Akira
Format:	Book
Language:	English
Published:	Bellingham, Washington : SPIE, [1997]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 3225.
Subjects:	Micromachining > Congresses. Microlithography > Congresses. Measurement > Congresses.

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