APA (7th ed.) Citation

Semiconductor Equipment and Materials Institute, National Institute of Standards and Technology (U.S.), Solid State Technology, Society of Photo-optical Instrumentation Engineers, Friedrich, C., & Umeda, A. (1997). Microlithography and metrology in micromachining III: 29-30 September 1997, Austin, Texas. SPIE.

Chicago Style (17th ed.) Citation

Semiconductor Equipment and Materials Institute, National Institute of Standards and Technology (U.S.), Solid State Technology, Society of Photo-optical Instrumentation Engineers, Craig Friedrich, and Akira Umeda. Microlithography and Metrology in Micromachining III: 29-30 September 1997, Austin, Texas. Bellingham, Washington: SPIE, 1997.

MLA (9th ed.) Citation

Semiconductor Equipment and Materials Institute, et al. Microlithography and Metrology in Micromachining III: 29-30 September 1997, Austin, Texas. SPIE, 1997.