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In-line characterization techniques for performance and yield enhancement in microelectronic manufacturing : 1-2 October 1997, Austin, Texas /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, Solid State Technology, Electrochemical Society
Other Authors: DeBusk, Damon, Ajuria, Sergio
Format: Book
Language:English
Published: Bellingham, Wash., USA : SPIE, [1997]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 3215.
Subjects:
Integrated circuits > Design and construction > Congresses.
Semiconductors > Design and construction > Congresses.
Optical pattern recognition > Congresses.
Manufacturing processes > Congresses.

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Call Number: TK7871.85 .I485 1997
 
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TK7871.85 .I485 1997 Available