Cover Image

International Symposium on Plasma Process-Induced Damage : [proceedings].

Bibliographic Details
Corporate Authors: International Symposium on Plasma Process-Induced Damage, IEEE Electron Devices Society, American Vacuum Society, Ōyō Butsuri Gakkai
Format: Conference Proceeding
Language:English
Published: Sunnyvale, CA : Northern California Chapter of the American Vacuum Society, [1996-]
Subjects:
Semiconductor wafers > Congresses.
Semiconductors > Effect of radiation on > Congresses.
Plasma radiation > Congresses.
Description
Published:1st (13-14 May 1996)-
Item Description:Title from cover.
Physical Description:volumes : illustrations ; 28 cm.
Publication Frequency:Annual