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International Symposium on Plasma Process-Induced Damage : [proceedings].

Bibliographic Details
Corporate Authors: International Symposium on Plasma Process-Induced Damage, IEEE Electron Devices Society, American Vacuum Society, Ōyō Butsuri Gakkai
Format: Conference Proceeding
Language:English
Published: Sunnyvale, CA : Northern California Chapter of the American Vacuum Society, [1996-]
Subjects:
Semiconductor wafers > Congresses.
Semiconductors > Effect of radiation on > Congresses.
Plasma radiation > Congresses.

Remote Storage

Holdings details from Remote Storage
Call Number: TK7871.85 .I5834
Notes: Subscription converted to electronic format.
Library Owns: TK7871.85 .I5834 (1st-8th (1996-2003))
Call Number Status Get It
TK7871.85 .I5834 1st 1996 Available
TK7871.85 .I5834 2nd 1997 Available
TK7871.85 .I5834 3rd 1999 Available
TK7871.85 .I5834 4th 1999 Available
TK7871.85 .I5834 5th 2000 Available
TK7871.85 .I5834 6th 2001 Available
TK7871.85 .I5834 7th 2002 Available
TK7871.85 .I5834 8th 2003 Available