Optical microlithography X : 12-14 March 1997, Santa Clara, California /

Bibliographic Details
Corporate Authors:	Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, SEMATECH (Organization)
Other Authors:	Fuller, Gene E.
Format:	Book
Language:	English
Published:	Bellingham, Washington : SPIE, [1997]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 3051.
Subjects:	Microlithography > Congresses. Integrated circuits > Very large scale integration > Congresses.

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