Cover Image

Metrology, inspection, and process control for microlithography XI : 10-12 March 1997, Santa Clara, California /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, Semiconductor Equipmant and Materials International, SEMATECH (Organization)
Other Authors: Jones, Susan K.
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [1997]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 3050.
Subjects:
Integrated circuits > Inspection > Congresses.
Integrated circuits > Measurement > Congresses.
Integrated circuits > Congresses.
Measurement > Congresses.
Description
Item Description:Previous volumes entitled: Integrated circuit metrology, inspection and process control.
Physical Description:x, 636 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819424641